Laboratory of Thin Film Technology

10.12.2021

#research

Contact:

Kaupo Kukli

Institute of Physics

Laboratory of Thin Film Technology

Head of Laboratory, Professor in Materials Science

kaupo.kukli@ut.ee

+372 737 4673

Laboratory of Thin Film Technology is concentrated on research and development of methods for preparation and characterization of thin and ultra-thin solid films, application of these methods and teaching of students in this field. Application areas of the materials that are being studied range from anticorrosion coatings to micro- and nanoelectronics.

Equipment for electron beam evaporation, magnetron sputtering and atomic layer deposition of thin solid films as well as for chemical vapor deposition of graphene is in the possession of the the personnel of the laboratory. Formation of thin films in atomic layer deposition and electron beam evaporation processes can be monitored with subnanometer resolution in real time. For characterization of materials, X-ray diffraction, X-ray reflection, X-ray fluorescence, scanning electron microscopy, electron probe microanalysis, spectroscopic ellipsometry and scanning probe methods can be used. Electrical properties and gas sensitivity of thin films can also be measured at the Laboratory of Thin Film Technology.

In the Laboratory of Thin Film Technology:

Novel methods for real-time characterization of atomic layer deposition processes have been developed
Technologies for preparation of efficient anti-corrosion coatings have been advanced
New methods for deposition of dielectrics with high dielectric constant for nanoelectronic devices have been developed
Methods for chemical vapor deposition of graphene have been implemented.

Kaupo Kukli
Head of Laboratory
Professor in Material Science, PhD (Applied Physics)
E-post: kaupo.kukli@ut.ee
Telefon: 737 4673
Kabinet: W. Ostwaldi 1-C206

Aile Tamm
Associate Professor in Material Science, PhD (Solid State Physics)
E-post: aile.tamm@ut.ee
Telefon: 737 4662
Kabinet: W. Ostwaldi 1-C211

Hugo Mändar
Associate Professorin Material Science, cand (Physics-Mathematics)
E-post: hugo.mandar@ut.ee
Telefon: 737 5537
Kabinet: W. Ostwaldi 1-C209

Harry Alles
Associate Professor in Material Science, PhD
E-post: harry.alles@ut.ee
Telefon: 737 4658
Kabinet: W. Ostwaldi 1-C206

Jaan Aarik
Professor emeritus, PhD (Applied Physics)
E-post: jaan.aarik@ut.ee
Telefon: 737 4674
Kabinet: W. Ostwaldi 1-C309

Väino Sammelselg
Professor emeritus, cand (Physics-Mathematics)
E-post: vaino.sammelselg@ut.ee
Telefon: 737 4705

Aarne Kasikov
Research Fellow in Material Science, PhD (Applied Physics)
E-post: aarne.kasikov@ut.ee
Telefon: 737 4654,737 4656
Kabinet: W. Ostwaldi 1-C307

Taivo Jõgiaas
Research Fellow in Material Science, PhD (Materials Science)
E-post: taivo.jogiaas@ut.ee
Kabinet: W. Ostwaldi 1-C207

Jekaterina Kozlova
Research Fellow in Electron Microscopy, PhD (Materials Science)
E-post: jekaterina.kozlova@ut.ee
Telefon: 737 4672
Kabinet: W. Ostwaldi 1-C211

Kristjan Kalam
Research Fellow in Material Science, PhD (Materials Science)
E-post: kristjan.kalam@ut.ee
Telefon: 737 5877
Kabinet: W. Ostwaldi 1-C207

Jordi Muñoz Gorriz
Visiting Research Fellow, PhD
E-post: jordi.munoz.gorriz@ut.ee

Helle-MaiPiirsoo
Junior Research Fellow in Material Science, MSc (Materials Science)
E-post: helle-mai.piirsoo@ut.ee
Telefon: 737 4659
Kabinet: W. Ostwaldi 1-C207

Joonas Merisalu
Junior Research Fellow, MSc (Robotics and Computer Engineering)
E-post: joonas.merisalu@ut.ee
Kabinet: W. Ostwaldi 1-C207

Markus Otsus
Junior Research Fellow, MSc (Materials Science)
E-post: markus.otsus@ut.ee
Kabinet: W. Ostwaldi 1-C207

Mahtab Salari Mehr
Junior Research Fellow in Material Science, MSc (Materials Science)
E-post: mahtab.salari.mehr@ut.ee

Maido Merisalu
Engineer, MSc (Materials Science)
E-post: maido.merisalu@ut.ee
Telefon: 737 4660
Kabinet: W. Ostwaldi 1-C215

Aivar Tarre
Engineer, MSc (Applied Physics)
E-post: aivar.tarre@ut.ee
Telefon: 737 4614
Kabinet: W. Ostwaldi 1-C308

Lauri Aarik
Engineer, PhD (Materials Science)
E-post: lauri.aarik@ut.ee
Telefon: 737 4673, 737 4675
Kabinet: W. Ostwaldi 1-C310

Kristina Raudonen
Laboratory Assistant
E-post: kristina.raudonen@ut.ee
Kabinet: W. Ostwaldi 1-C07

Tauno Kahro
Engineer, MSc (Materials Science)
E-post: tauno.kahro@ut.ee
Telefon: 737 4708

Raul Rammula
Engineer, PhD (Applied Physics)
E-post: raul.rammula@ut.ee
Telefon: 737 4673

Alma-Asta Kiisler
Engineer
E-post: alma-asta.kiisler@ut.ee
Telefon: 737 4665
Kabinet: W. Ostwaldi 1-C311

Peeter Ritslaid
Engineer
E-post: peeter.ritslaid@ut.ee
Telefon: 737 4654
Kabinet: W. Ostwaldi 1-C208

Ivan Netšipailo
Engineer, MSc (Physical Technology of Materials)

Lii Urb
Laboratory Assistant
E-post: lii.urb@ut.ee

Kaisa Aab
Laboratory Specialist
E-post: kaisa.aab@ut.ee

Toomas Daniel Viskus
Specialist in Materials Science
E-post: toomas.daniel.viskus@ut.ee
Kabinet: W. Ostwaldi 1-C320

new! Resistive switching in artificially designed materials for data processing (PRG753).
2020-2024, Personal research funding: Team grant (PRG)
Principal investigator prof. Kaupo Kukli
new! Formation and stabilization of high-density hard phases of optical materials in thin-film structures (PSG448).
2020-2023, Personal research funding: Start-up grant (PSG)
Principal investigator dr. Lauri Aarik
Emerging Novel Phases in Strongly Frustrated Quantum Magnets (ENIQMA)
2018-2022, Personal research funding: Team grant (PRG) PRG4, Estonian Research Council
Principal investigator of UT dr. Aile Tamm
Emerging orders in quantum and nanomaterials (TK134)
2016-2023, Archimedes Foundation
Principal Investigator dr. Aile Tamm

Selection of publications by the laboratory personnel

Enhanced design of multiplexed coded masks for Fresnel incoherent correlation holography.
Gopinath. S.; Bleahu, A.; Kahro, T.; Rajeswary, A. S. J. F.; Kumar, R.; Kukli, K.; Tamm, A.; Rosen, J.; Anand, V. Scientific Reports 13 (2023) 7390; https://doi.org/10.1038/s41598-023-34492-2
Development and Concentration of Residual Impurities in Hafnium–Titanium-Oxide Films Grown by Atomic Layer Deposition.
Aarik. L.; Arroval, T.; Ritslaid, P.; Vask, A.; Mändar, H.; Aarik, J. Crystal Growth & Design 23 (1) (2023) 548−557; https://doi.org/10.1021/acs.cgd.2c01174
Influence of Annealing on Mechanical Behavior of Alumina-Tantala Nanolaminates.
Piirsoo. H.-M.; Jõgiaas, T.; Kukli, K.; Tamm, A. Materials 16 (8) (2023) 3027; doi: https://doi.org/10.3390/ma16083207
Nanostructures stacked on hafnium oxide films interfacing graphene and silicon oxide layers as resistive switching media.
Kahro. T.; Raudonen, K.; Merisalu, J.; Tarre, A.; Ritslaid, P.; Kasikov, A.;Jõgiaas, T.; Käämbre, T.; Otsus, M.; Kozlova, J.; Alles, H.; Tamm, A.; Kukli, K. Nanomaterials 13 (8) (2023) 1323; doi: https://doi.org/10.3390/nano13081323.

Nanoindentation of Chromium Oxide Possessing Superior Hardness among Atomic-Layer-Deposited Oxides.
Jõgiaas. T.; Tarre, A.; Mändar, H.; Kozlova, J.; Tamm, A. Nanomaterials 12 (1) (2022) 82; doi: https://doi.org/10.3390/nano12010082.

Iron and cobalt containing electrospun carbon nanofibre-based cathode catalysts for anion exchange membrane fuel cell.
Sokka, A.; Mooste, M.; Käärik, M.; Gudkova, V.; Kozlova, J.; Kikas, A.; Kisand, V.; Treshchalov, A.; Tamm, A.; Paiste, P.; Aruväli, J.; Leis, J.; Krumme, A.; Holdcroft, S.; Cavaliere, S.; Jaouen, F.; Tammeveski, K. International Journal of Hydrogen Energy 46 (61) (2021) 31275-31287; doi: https://doi.org/10.1016/j.ijhydene.2021.07.025.
Study of RTN signals in resistive switching devices based on neural networks.
González-Cordero, G.; González, M. B.; Zabala, M.; Kalam, K.; Tamm, A.; Jiménez-Molinos, F.; Campabadal, F.; Roldán, J. B. Solid-State Electronics (2021) 108034; doi: https://doi.org/10.1016/j.sse.2021.108034.
Mesoporous iron-nitrogen co-doped carbon material as cathode catalyst for the anion exchange membrane fuel cell.
Lilloja, J.; Mooste, M.; Kibena-Põldsepp, E.; Sarapuu, A.; Zulevi, B.; Kikas, A.; Piirsoo, H.-M.; Tamm, A.; Kisand, V.; Holdcroft, S.; Serov, A.; Tammeveski, K. Journal of Power Sources Advances 8 (2021) 100052; doi: https://doi.org/10.1016/j.powera.2021.100052.
Microstructure and mechanical properties of atomic layer deposited alumina doped zirconia.
Piirsoo, H.-M.; Jõgiaas, T.; Mändar, H.; Ritslaid, P.; Kukli, K.; Tamm, A. AIP Advances 11 (5) (2021) 055316; doi: 10.1063/5.0047572.
Atomic layer deposition of superparamagnetic ruthenium-doped iron oxide thin film.
Tamm, A.; Tarre, A.; Kozlova, J.; Rähn, M.; Jõgiaas, T.; Kahro, T.; Link, J.; Stern, R. RSC Advances 11 (13) (2021) 7521−7526; doi:10.1039/D1RA00507C.
Atomic layer deposited nanolaminates of zirconium oxide and manganese oxide from manganese(III)acetylacetonate and ozone.
Kalam, K.; Rammula, R.; Ritslaid, P.; Käämbre, T.; Link, J.; Stern, R.; Vinuesa, G.; Duenas, S.; Castán, H.; Tamm, A.; Kukli, K. Nanotechnology 32 (2021) 335703; doi: 10.1088/1361-6528/abfee9.
Hafnium Oxide/Graphene/Hafnium Oxide-Stacked Nanostructures as Resistive Switching Media.
Kahro, T.; Tarre, A.; Käämbre, T.; Piirsoo, H.-M.; Kozlova, J.; Ritslaid, P.; Kasikov, A.; Jõgiaas, T.; Vinuesa, G.; Dueñas, S.; Castán, H.; Tamm, A.; Kukli, K. ACS Applied Nano Materials 4 (5) (2021) 5152−5163; doi: 10.1021/acsanm.1c00587.
Effective corrosion protection of aluminum alloy AA2024-T3 with novel thin nanostructured oxide coating.
Merisalu, M.; Aarik, L.; Kozlova, J.; Mändar, H.; Tarre, A.; Sammelselg, V. Surface and Coatings Technology 411 (2021) 126993; doi: 10.1016/j.surfcoat.2021.126993.

Image	Atomic layer deposition device; Picosun R200 Manufacturer: Picosun, Finland Industrial Plasma enhanced reactor. The choice of starting materials and processes is limited (depending on the specifics of the device) and mainly metal oxides such as HfO₂, Al₂O₃ or TiO₂ are deposited.
Image	Chemical Vapor Deposition Manufacturer: homemade Special purpose low pressure quartz reactor equipment for the deposition of ultra-thin films.
Image	Preparing of metallic- and nonmetallic films Equipment for the deposition of thin films (electron beam, thermal evaporation, magnetron sputtering).

Image	SmartLab diffractometer Manufacturer: Rigaku, Japan Multifunctional X-ray diffractometer for studying the structure of materials. Available analytical methods: XRD, GIXRD, IP-XRD, HR-XRD, UHR-XRD, XRR, SAXS, GI-SAXS, HT-XRD.
Image	X-ray fluorecent spectrometer ZSX-400 Manufacturer: Rigaku, Japan Elemental analysis of thin layered structures.
Image	At the Cascade Microtech probe station measuring set based on MPS150 Manufacturer: Beaverton, OR, USA By adding additional measuring devices to the probe station as desired (e.g. current, voltage, capacitance, etc.), the electrical properties of the planar objects can be studied.
Image	Spectrosycopic ellipsometer GES-5E Manufacturer: Semilab, Sopra To evaluate the thickness and refractive index of planar layered structures.