Laboratory of Thin Film Technology
Laboratory of Thin Film Technology is concentrated on research and development of methods for preparation and characterization of thin and ultra-thin solid films, application of these methods and teaching of students in this field. Application areas of the materials that are being studied range from anticorrosion coatings to micro- and nanoelectronics.
Equipment for electron beam evaporation, magnetron sputtering and atomic layer deposition of thin solid films as well as for chemical vapor deposition of graphene is in the possession of the the personnel of the laboratory. Formation of thin films in atomic layer deposition and electron beam evaporation processes can be monitored with subnanometer resolution in real time. For characterization of materials, X-ray diffraction, X-ray reflection, X-ray fluorescence, scanning electron microscopy, electron probe microanalysis, spectroscopic ellipsometry and scanning probe methods can be used. Electrical properties and gas sensitivity of thin films can also be measured at the Laboratory of Thin Film Technology.
In the Laboratory of Thin Film Technology:
- Novel methods for real-time characterization of atomic layer deposition processes have been developed
- Technologies for preparation of efficient anti-corrosion coatings have been advanced
- New methods for deposition of dielectrics with high dielectric constant for nanoelectronic devices have been developed
- Methods for chemical vapor deposition of graphene have been implemented.
| Kaupo Kukli Head of Laboratory Professor in Materials Science, PhD (Applied Physics) E-mail: kaupo.kukli@ut.ee Phone: 737 4673 Room: W. Ostwaldi 1-C206 |
| Harry Alles Associate Professor in Materials Science, PhD E-mail: harry.alles@ut.ee Phone: 737 4658 Room: W. Ostwaldi 1-C206 |
| Hugo Mändar Associate Professorin Materials Science, cand (Physics-Mathematics) E-mail: hugo.mandar@ut.ee Phone: 737 5537 Room: W. Ostwaldi 1-C209 |
| Jaan Aarik Professor emeritus, PhD (Applied Physics) E-mail: jaan.aarik@ut.ee Phone: 737 4674 Room: W. Ostwaldi 1-C309 |
| Väino Sammelselg Professor emeritus, cand (Physics-Mathematics) E-mail: vaino.sammelselg@ut.ee Phone: 737 4705 |
| Aarne Kasikov Research Fellow in Materials Science, PhD (Applied Physics) E-mail: aarne.kasikov@ut.ee Phone: 737 4654,737 4656 Room: W. Ostwaldi 1-C307 |
| Kristjan Kalam Research Fellow in Materials Science, PhD (Materials Science) E-mail: kristjan.kalam@ut.ee Phone: 737 5877 Room: W. Ostwaldi 1-C207 |
| Taivo Jõgiaas Research Fellow in Materials Science, PhD (Materials Science) E-mail: taivo.jogiaas@ut.ee Room: W. Ostwaldi 1-C207 |
| Jekaterina Kozlova Research Fellow in Electron Microscopy, PhD (Materials Science) E-mail: jekaterina.kozlova@ut.ee Phone: 737 4672 Room: W. Ostwaldi 1-C211 |
| Markus Otsus Junior Research Fellow, MSc (Materials Science) E-mail: markus.otsus@ut.ee Room: W. Ostwaldi 1-C207 |
| Mahtab Salari Mehr Junior Research Fellow in Materials Science , MSc (Material Science and Engineering) E-mail: mahtab.salari.mehr@ut.ee |
| Oliver Vanker Junior Research Fellow in Materials Science, MSc (Materials Science and Technology) E-mail: oliver.vanker@ut.ee Room: W. Ostwaldi 1-C207 |
| Toomas Daniel Viskus Junior Research Fellow in Materials Science, MSc (Materials Science and Technology) E-mail: toomas.daniel.viskus@ut.ee W. Ostwaldi 1 |
| Joonas Merisalu Specialist in Materials Science E-mail: joonas.merisalu@ut.ee W. Ostwaldi 1 |
| Aivar Tarre Engineer, MSc (Applied Physics) E-mail: aivar.tarre@ut.ee Phone: 737 4614 Room: W. Ostwaldi 1-C308 |
| Tauno Kahro Specialist in Material Science, MSc (Materials Science) E-mail: tauno.kahro@ut.ee Phone: 737 4708 |
| Lauri Aarik Engineer, PhD (Materials Science) E-mail: lauri.aarik@ut.ee Phone: 737 4673, 737 4675 Room: W. Ostwaldi 1-C310 |
| Raul Rammula Engineer, PhD (Materials Science) E-mail: raul.rammula@ut.ee Phone: 737 4673 |
| Alma-Asta Kiisler Engineer E-mail: alma-asta.kiisler@ut.ee Phone: 737 4665 Room: W. Ostwaldi 1-C311 |
| Peeter Ritslaid Engineer E-mail: peeter.ritslaid@ut.ee Phone: 737 4654 Room: W. Ostwaldi 1-C208 |
| Helle-Mai Piirsoo Specialist in Material Science, PhD (Materials Science) E-mail: helle-mai.piirsoo@ut.ee Phone: 737 4659 Room: W. Ostwaldi 1-C207 |
| Ivan Netšipailo Engineer, MSc (Physical Technology of Materials) E-mail: ivan.netchipailo@ut.ee |
| Maido Merisalu Engineer, Phd (Materials Science) E-mail: maido.merisalu@ut.ee Phone: 737 4660 Room: W. Ostwaldi 1-C215 |
| Jaan Erik Krull Laboratory Assistant E-mail: jaan.erik.krull@ut.ee Room: W. Ostwaldi 1-C211 |
| Agnes Rohtsalu Laboratory Assistant E-mail: agnes.rohtsalu@ut.ee Room: W. Ostwaldi 1-C211 |
| Markus Kõiv Laboratory Assistant E-mail: markus.koiv@ut.ee Room: W. Ostwaldi 1-C207 |
| Laura Kelk Laboratory Assistant E-mail: laura.kelk@ut.ee Room: W. Ostwaldi 1-C211 |
| Anna Maria Tuberg Laboratory Assistant E-mail: anna.maria.tuberg@ut.ee Room: W. Ostwaldi 1-C211 |
| Uku Andreas Reigo Laboratory Assistant E-mail: uku.andreas.reigo@ut.ee Room: W. Ostwaldi 1-C211 |
| Aile Tamm Associate Professor in Materials Science, PhD (Solid State Physics) |
new! Heterostructures of wide-bandgap oxide semiconductors with tunable phase composition (PRG2594).
2025-2029, R&D project
Principal investigator prof. Kaupo Kuklinew! Carbide synthesis from recycled materials for use in manufacturing and high-tech industries (TEM-TA31).
2024-2028, R&D project
Principal investigator assoc. prof. Harry AllesResistive switching in artificially designed materials for data processing (PRG753).
2020-2024, Personal research funding: Team grant (PRG)
Principal investigator prof. Kaupo KukliFormation and stabilization of high-density hard phases of optical materials in thin-film structures (PSG448).
2020-2023, Personal research funding: Start-up grant (PSG)
Principal investigator dr. Lauri Aarik- Emerging Novel Phases in Strongly Frustrated Quantum Magnets (ENIQMA)
2018-2022, Personal research funding: Team grant (PRG) PRG4, Estonian Research Council
Principal investigator of UT dr. Aile Tamm - Emerging orders in quantum and nanomaterials (TK134)
2016-2023, Archimedes Foundation
Principal Investigator dr. Aile Tamm
Selection of publications by the laboratory personnel
Graphene/TiO2 Heterostructure Integrated with a Micro-Lightplate for Low-Power NO2 Gas Detection.
Vafaei, P.; Kodu, M.; Alles, H.; Kiisk, V.; Casals, O.; Prades, J. D.; Jaaniso, R. Sensors 25 (2) (2025), 382; doi: https://doi.org/10.3390/s25020382
Berholts, A.; Kodu, M.; Rubin. P.; Kahro, T.; Alles, H.; Jaaniso, R. ACS Applied Materials & Interfaces 16 (33) (2024), 43827−43837; doi: https://doi.org/10.1021/acsami.4c08151
Enhanced design of multiplexed coded masks for Fresnel incoherent correlation holography.
Gopinath. S.; Bleahu, A.; Kahro, T.; Rajeswary, A. S. J. F.; Kumar, R.; Kukli, K.; Tamm, A.; Rosen, J.; Anand, V. Scientific Reports 13 (2023) 7390; https://doi.org/10.1038/s41598-023-34492-2
Aarik. L.; Arroval, T.; Ritslaid, P.; Vask, A.; Mändar, H.; Aarik, J. Crystal Growth & Design 23 (1) (2023) 548−557; https://doi.org/10.1021/acs.cgd.2c01174
Influence of Annealing on Mechanical Behavior of Alumina-Tantala Nanolaminates.
Piirsoo. H.-M.; Jõgiaas, T.; Kukli, K.; Tamm, A. Materials 16 (8) (2023) 3027; doi: https://doi.org/10.3390/ma16083207
Kahro. T.; Raudonen, K.; Merisalu, J.; Tarre, A.; Ritslaid, P.; Kasikov, A.;Jõgiaas, T.; Käämbre, T.; Otsus, M.; Kozlova, J.; Alles, H.; Tamm, A.; Kukli, K. Nanomaterials 13 (8) (2023) 1323; doi: https://doi.org/10.3390/nano13081323.
Nanoindentation of Chromium Oxide Possessing Superior Hardness among Atomic-Layer-Deposited Oxides.
Jõgiaas. T.; Tarre, A.; Mändar, H.; Kozlova, J.; Tamm, A. Nanomaterials 12 (1) (2022) 82; doi: https://doi.org/10.3390/nano12010082.
Sokka, A.; Mooste, M.; Käärik, M.; Gudkova, V.; Kozlova, J.; Kikas, A.; Kisand, V.; Treshchalov, A.; Tamm, A.; Paiste, P.; Aruväli, J.; Leis, J.; Krumme, A.; Holdcroft, S.; Cavaliere, S.; Jaouen, F.; Tammeveski, K. International Journal of Hydrogen Energy 46 (61) (2021) 31275-31287; doi: https://doi.org/10.1016/j.ijhydene.2021.07.025.
Study of RTN signals in resistive switching devices based on neural networks.
González-Cordero, G.; González, M. B.; Zabala, M.; Kalam, K.; Tamm, A.; Jiménez-Molinos, F.; Campabadal, F.; Roldán, J. B. Solid-State Electronics (2021) 108034; doi: https://doi.org/10.1016/j.sse.2021.108034.
Lilloja, J.; Mooste, M.; Kibena-Põldsepp, E.; Sarapuu, A.; Zulevi, B.; Kikas, A.; Piirsoo, H.-M.; Tamm, A.; Kisand, V.; Holdcroft, S.; Serov, A.; Tammeveski, K. Journal of Power Sources Advances 8 (2021) 100052; doi: https://doi.org/10.1016/j.powera.2021.100052.
Microstructure and mechanical properties of atomic layer deposited alumina doped zirconia.
Piirsoo, H.-M.; Jõgiaas, T.; Mändar, H.; Ritslaid, P.; Kukli, K.; Tamm, A. AIP Advances 11 (5) (2021) 055316; doi: 10.1063/5.0047572.
Atomic layer deposition of superparamagnetic ruthenium-doped iron oxide thin film.
Tamm, A.; Tarre, A.; Kozlova, J.; Rähn, M.; Jõgiaas, T.; Kahro, T.; Link, J.; Stern, R. RSC Advances 11 (13) (2021) 7521−7526; doi:10.1039/D1RA00507C.
Kalam, K.; Rammula, R.; Ritslaid, P.; Käämbre, T.; Link, J.; Stern, R.; Vinuesa, G.; Duenas, S.; Castán, H.; Tamm, A.; Kukli, K. Nanotechnology 32 (2021) 335703; doi: 10.1088/1361-6528/abfee9.
Hafnium Oxide/Graphene/Hafnium Oxide-Stacked Nanostructures as Resistive Switching Media.
Kahro, T.; Tarre, A.; Käämbre, T.; Piirsoo, H.-M.; Kozlova, J.; Ritslaid, P.; Kasikov, A.; Jõgiaas, T.; Vinuesa, G.; Dueñas, S.; Castán, H.; Tamm, A.; Kukli, K. ACS Applied Nano Materials 4 (5) (2021) 5152−5163; doi: 10.1021/acsanm.1c00587.
Merisalu, M.; Aarik, L.; Kozlova, J.; Mändar, H.; Tarre, A.; Sammelselg, V. Surface and Coatings Technology 411 (2021) 126993; doi: 10.1016/j.surfcoat.2021.126993.
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| Atomic layer deposition device; Picosun R200 Manufacturer: Picosun, Finland Industrial Plasma enhanced reactor. The choice of starting materials and processes is limited (depending on the specifics of the device) and mainly metal oxides such as HfO2, Al2O3 or TiO2 are deposited |
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| Atomic Layer Deposition Manufacturer: in-house made Atomic Layer Deposition reactor for wide range of starting materials and processes |
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| Chemical Vapor Deposition Manufacturer: in-house made Special purpose low pressure quartz reactor equipment for the deposition of ultra-thin films. |
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| Preparing of metallic- and nonmetallic films Equipment for the deposition of thin films (electron beam, thermal evaporation, magnetron sputtering) |
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| Electron beam evaporation device VS-17 VS-17 is equipped with an electron gun for evaporating materials in vacuum |
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| SmartLab diffractometer Manufacturer: Rigaku, Japan Multifunctional X-ray diffractometer for studying the structure of materials. Available analytical methods: XRD, GIXRD, IP-XRD, HR-XRD, UHR-XRD, XRR, SAXS, GI-SAXS, HT-XRD |
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| X-ray fluorecence spectrometer ZSX-400 Manufacturer: Rigaku, Japan Elemental analysis of thin layered structures |
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| At the Cascade Microtech probe station measuring set based on MPS150 Manufacturer: Beaverton, OR, USA By adding additional measuring devices to the probe station as desired (such as devices for measuring current, voltage, capacitance, etc.), the electrical properties of the planar objects can be studied |
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| Spectrosycopic ellipsometer GES-5E Manufacturer: Semilab, Sopra To evaluate the thickness and refractive index of planar layered structures |
- Helle-Mai Piirsoo 2024
- Kristel Möls 2024
- Joonas Merisalu 2024
- Maido Merisalu 2022
- Helina Seemen 2021
- Kristjan Kalam 2020
- Jekaterina Kozlova 2019
- Lauri Aarik 2017
- Taivo Jõgiaas 2017
- Jay Mondal 2016
- ERR video. We are from 18:22
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